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BARC
Bottom Anti-Reflection Coating
As the pattern size of the semiconductor device becomes increasingly smaller, it is necessary to maintain the reflectivity less than 1% during the exposure process to form a consistent pattern and to achieve the desired yield rate through the appropriate process margin. BARC is a light absorber and an organic antireflection film contains it to avoid light reflection from the bottom film layer and to remove the standing wave during exposure when forming a pattern using lithography.

Usage

  • Memory
  • Nonmemory
  • Power-chip semiconductors

Features

  • High light absorptiveness and price competitiveness (Many products with different physical properties)

ProductEXPAND All

BARC
테이블
Category Grade n/k value@ 193nm Bake Temp. (℃/sec)
BARC ArF High k grade 1.64/0.51 230℃/60sec
ArF Low k grade 1.73/0.30 230℃/60sec
BARC_KrF
테이블
Category Grade n/k value@ 248nm Bake Temp. (℃/sec)
BARC_KrF KrF 1.53/0.42 205~230℃/60sec

Contact

테이블
Division Region Name TEL EMAIL
Sales Jinhan Lee +82-2-6961-2003 mail
Technical Service Eunhee Han +82-41-423-3234 mail
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